Rolling Mask Lithography System


The Rolling Mask lithography system is an optical lithography process considered to be a competing technology of nanoimprint lithography. Rolith’s proprietary manufacturing technology employs a parallel patterning scheme easily scalable to large areas of rigid substrate materials (plates and panels) and rolls of flexible films. This nanofabrication method combines the advantages of Soft Lithography and Near-field Optical Lithography. Specific implementation of phase-shift mask approach and plasmonic printing will allow printing structures with feature sizes down to 50 nm. Photoresist patterning is followed by substrate material etch, deposition of functional materials through photoresist template, or conversion of photoresist nanostructure into a functional material.

Information Verified: 
April, 2013

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