Cymer Laser-Produced Plasma (LPP) EUV Source System


The Cymer Laser-Produced Plasma (LPP) extreme ultraviolet light (EUV) Source System consists of a high power, high repetition rate pulsed CO2 laser, a beam delivery system, and a plasma vacuum vessel - complete with a droplet generator and collector, debris mitigation, and in-situ metrology to measure, monitor and control the system operation. This system is designed to pattern below the 22nm node.

Cymer has two EUV light source products: the HVM I and the HVM II. Cymer's HVM I is the first generation EUV source, supplying the semiconductor industry with the first LPP light source for EUV lithography. The Cymer HVM II lightsource is planned for first deliveries to scanner manufacturers in the first half of 2012. The light source used in EUV lithography has a wavelength of 13.5 nm.

Information Verified: 
April, 2013

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