Cymer DUV Lithography Light Sources


Cymer offers a range of deep ultraviolet (DUV) light sources for semiconductor manufacturing applications based on DUV lithography. DUV light sources include argon fluoride (ArF) immersion and dry light sources and krypton fluoride (KrF) light sources. The KrF sources were first released in 1996 when chipmakers reached the 250nm production node.

Deep UV light for lithography is generated by excimer light sources. The light is passed through a Beam Delivery Unit (BDU), filtered through the reticle (or mask), and then projected onto the prepared silicon wafer. In this way it patterns a chip design onto a photoresist that is then etched, cleaned and the process repeats. The wavelength for KrF is 248nm and 193nm for ArF excimer lasers used in development and volume manufacturing. DUV lithography with ArF light sources has been used to pattern down to the 45nm node using immersion lithography and to the 32nm node with double patterning. Beyond this, EUV light sources can be used.

Information Verified: 
April, 2013

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